Last edited by Vodal
Tuesday, October 6, 2020 | History

5 edition of Principles of Chemical Vapor Deposition found in the catalog.

Principles of Chemical Vapor Deposition

by D.M. Dobkin

  • 270 Want to read
  • 4 Currently reading

Published by Springer .
Written in English

    Subjects:
  • Engineering: general,
  • Metals technology / metallurgy,
  • Vapor-plating,
  • Refractory coating,
  • Engineering - Industrial,
  • Science,
  • Technology & Industrial Arts,
  • Science/Mathematics,
  • Technical & Manufacturing Trades,
  • Physics,
  • Technology / Material Science,
  • Technology / Technical & Manufacturing Industries & Trades,
  • Chemistry - General,
  • Material Science

  • The Physical Object
    FormatHardcover
    Number of Pages288
    ID Numbers
    Open LibraryOL8370545M
    ISBN 101402012489
    ISBN 109781402012488

    In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. Table of Contents Acknowledgements. HANDBOOK OF CHEMICAL VAPOR DEPOSITION (CVD) Principles, Technology, and Applications Second Edition NOYES PUBLICATIONS Park Ridge, New Jersey, U.S.A. WILLIAM ANDREW PUBLISHING, LLC Norwich, New York, U.S.A. by Hugh O. Pierson Consultant and Sandia National Laboratories (retired) Albuquerque, New Mexico.

    : Chemical Vapor Deposition: Principles and Applications () and a great selection of similar New, Used and Collectible Books available now at great Range: $ - $ Find many great new & used options and get the best deals for Principles of Chemical Vapor Deposition by M. K. Zuraw and Daniel M. Dobkin (, Paperback) at the best online prices at eBay! Free shipping for many products!

    Principles of Physical Vapor Deposition of Thin Films | K. Harsha | download | B–OK. Download books for free. Find books. Handbook of Chemical Vapor Deposition: Principles, Technology, Applications, 2nd Edition. Hardcover | Product code: G | ISBN:


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Principles of Chemical Vapor Deposition by D.M. Dobkin Download PDF EPUB FB2

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.4/5(1).

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased : $   If the answer to this is yes, then Principles of Chemical Vapor Deposition is for you.

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics.

In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.

This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors. Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics.

In addition, the book. This book is for folks with a background in the sciences but no acquaintance with chemical vapor deposition. It is oriented towards semiconductor applications. The book discusses all the needed. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics.

The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Principles of Chemical Vapor Deposition.

This chapter discusses the chemical vapor deposition (CVD) process. CVD is defined as the deposition of a solid on a heated surface from a chemical reaction in the vapor phase. It belongs to the class of vapor-transfer processes, which is atomistic in nature. This book presents study of chemical vapor deposition (CVD).

CVD is an inherently interdisciplinary field. Its understanding requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics and kinetics, as well as homogeneous and heterogenous chemical : Sherman, A.

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations.

Organized into 12 chapters, this book begins with an overview of the theoretical. Handbook of chemical vapor deposition (CVD), principles, technology, and applications. By Hugh O. Pierson, Noyes, Park Ridge, NJ, pp., hardback, $ 68, ISBN 0‐‐‐3 Toivo Kodas.

Chemical Engineering Department, University of New Mexico Albuquerque, NM (USA) Cited by: 6. Principles of Chemical Vapor Deposition: What's Going on Inside the Reactor by Daniel M. Dobkin and Michael K. Zuraw Kluwer Academic The book version of this web site tutorial, "Principles of Chemical Vapor Deposition", by Daniel M.

Dobkin and Michael K. Zuraw, published by Kluwer Academic, is available from Amazon. The book has most of the content of the web site. Purchase Handbook of Chemical Vapor Deposition - 2nd Edition. Print Book & E-Book. ISBNThe authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology.

This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics.

In addition, the book includes discussions of practical films and reactors to help in 4/5(1). Fundamentals of Chemical Vapor Deposition This tutorial seeks to provide an introduction to the underlying principles of chemical vapor deposition of films, with examples of films, reactors, and applications.

The emphasis is on microelectronic applications of these techniques, but the fundamentals of transport, chemistry, and plasma generation. In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD).

Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption.

Principles of chemical vapor deposition. [Daniel Mark Dobkin; Michael K Zuraw] -- "This book will be invaluable to process engineers, graduate students and researchers newly involved in the development of processes and hardware for chemical vapor deposition.

Chemical Vapor Deposition: Principles and Applications by Editor-M. L. Hitchman; Editor-K. F. Jensen and a great selection of related books, art and collectibles available now at - Chemical Vapor Deposition: Principles and Applications - AbeBooks.Books Principles of Chemical Vapor Deposition Daniel M.

Dobkin and Michael K. Zuraw, Kluwer Academic Publishers, The Netherlands, pp., $, This book provides a simple intro-duction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteris-tics.

It includes discussions of prac. Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics.

In addition, the book includes discussions of practical films and reactors to help in Pages: